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X-ray characterization of GGG homoepitaxial layers with introduced divalent Ni ions

机译：引入二价镍离子的GGG同质外延层的X射线表征

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摘要

The study of structural perfection of GGG homoepitaxial layers with incorporated divalent Ni ions Ni,Ge:GGG has been performed by means of HR X-ray diffraction and optical spectroscopy. Epitaxial layers were grown by the LPE technique from supercooled high temperature solution with different concentration of NiO and GeO2 on both sides of the polished < 1 1 1 > oriented GGG substrates. Incorporation of optically inert Ge~(4+) ions made it possible to incorporate Ni~(2+) ions in the garnet lattice. High structural perfection and the relevant absorption spectra are prerequisite for the use of Ni,Ge:GGG epitaxial layers as infrared saturable absorbers.
机译：已经通过HR X射线衍射和光谱学研究了掺入二价Ni离子Ni，Ge：GGG的GGG同质外延层的结构完善性。通过LPE技术从过冷的高温溶液中生长出外延层，该过冷的高温溶液在抛光的<1 1 1>取向的GGG衬底的两侧均具有不同浓度的NiO和GeO2。掺入光学惰性的Ge〜（4+）离子使得可以在石榴石晶格中掺入Ni〜（2+）离子。高度的结构完善性和相关的吸收光谱是使用Ni，Ge：GGG外延层作为红外可饱和吸收剂的先决条件。

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