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首页> 外文期刊>RSC Advances >Single step synthesis of (alpha-Fe2O3) hematite films by hydrothermal electrochemical deposition
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Single step synthesis of (alpha-Fe2O3) hematite films by hydrothermal electrochemical deposition

机译：水热电化学沉积一步法合成（α-Fe2O3）赤铁矿薄膜

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A single step electrodeposition of alpha-Fe2O3 films under hydrothermal conditions without post-annealing requirement is described. Primary attention is paid to understand the effects of synthesis conditions, such as temperature, precursor concentration, pH, and time on the structure and morphology of the films. Moreover, the photoelectrochemical properties of hematite films grown by hydrothermal-electrochemical deposition (HED) are also discussed. It is discovered that HED enables the production of crystalline alpha-Fe2O3 phase without thermal annealing as opposed to electrodepositions reported at ambient temperature. Photoelectrochemical studies demonstrated that better performance can be obtained with the films prepared at higher pH. A net photocurrent density of 23.6 mu A cm(-2) is obtained in 0.1 M NaOH under 1 sun conditions at 1.23 V vs. NHE with the film prepared from a bath containing 0.05 M FeCl2 and 0.2 M NaCH3COO via hydrothermal-electrodeposition with a photocurrent onset potential of 0.96 V vs. NHE.
机译：描述了在水热条件下无需后退火的单步电沉积α-Fe2O3薄膜。首先要注意了解合成条件的影响，例如温度，前体浓度，pH和时间对薄膜结构和形态的影响。此外，还讨论了通过水热电化学沉积（HED）生长的赤铁矿薄膜的光电化学性质。已经发现，与在环境温度下报道的电沉积相反，HED能够在不进行热退火的情况下生产结晶α-Fe2O3相。光电化学研究表明，在较高pH下制备的薄膜可获得更好的性能。在含有1.0 M FeCl2和0.2 M NaCH3COO的水浴中，通过水热电沉积，在0.1 M NaOH和1.23 V vs. NHE的太阳条件下，在0.1 M NaOH中于1 M的条件下获得的净光电流密度为23.6μA cm（-2）。 vs. NHE的光电流起始电位为0.96V。

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