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首页> 外文期刊>Optics Letters >Efficient refractive-index modification of fused silica by a resonance-photoionization-like process using F_(2) and KrF excimer lasers
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Efficient refractive-index modification of fused silica by a resonance-photoionization-like process using F_(2) and KrF excimer lasers

机译：通过使用F_（2）和KrF准分子激光的类似共振光电离的方法对熔融石英进行有效的折射率改性

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摘要

Novel materials processing by a multiwavelength excitation process using F_(2) and KrF excimer lasers for high-efficiency and high-speed refractive-index modification of fused silica is demonstrated. We find this process to be essentially superior to single-wavelength F_(2)-laser processing: The multiwavelength excitation process achieves more than twice the diffraction efficiency of fused silica modified by a F_(2) laser at the same total number of photons in each irradiated laser beam supplied to the fused-silica substrate. This superiority is attributed to a resonance-photoionization-like process based on excited-state absorption.
机译：演示了使用F_（2）和KrF准分子激光通过多波长激发工艺对熔融石英进行高效和高速折射率改性的新型材料工艺。我们发现此过程实质上优于单波长F_（2）激光处理：在相同的总光子数下，多波长激发过程实现了F_（2）激光改性的熔融石英的衍射效率的两倍以上。每个照射到熔融石英基板的激光束。这种优越性归因于基于激发态吸收的类似共振光电离的过程。

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