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Experimental demonstration of a cross-order echelle grating triplexer based on an amorphous silicon nanowire platform

机译:基于非晶硅纳米线平台的跨阶echelle光栅三工器的实验演示

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摘要

We present the design, fabrication, and characterization of an ultracompact silicon-on-insulator-based echelle grating triplexer. It is based on the cross-order design, which utilizes different diffraction orders to cover a large spectral range from 1.3 to 1.5 (mu)m with three channels located at 1310, 1490, and 1550 nm and with a footprint of 150 (mu)m X 130 (mu)m.
机译:我们介绍了基于超紧凑型绝缘体上硅的echelle光栅三工器的设计,制造和表征。它基于交叉顺序设计,利用不同的衍射顺序覆盖了从1.3到1.5μm的大光谱范围,三个通道分别位于1310、1490和1550 nm,占地面积为150(mu)。毫米×130微米。

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