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Isotype Surface-Barrier n-TiN-Si Heterostructure

机译:同型表面势垒n-TiN / n-Si异质结构

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摘要

n-TiN-Si heterostructures are prepared by reactive magnetron sputtering. The current–voltage characteristics of the heterostructures are measured at different temperatures. The temperature dependences of the potential-barrier height and the series resistance of the heterojunction are analyzed. The energy-band diagram for the heterojunctions under study is constructed. The concentration of heterojunction surface states is estimated to be 2.67 × 10~(13) cm~(–2). It is established that the dominant mechanisms of current transport through forward- and reverse-biased n-TiN-Si heterojunctions are described well within the tunnel and emission models.
机译:通过反应磁控溅射制备n-TiN / n-Si异质结构。异质结构的电流-电压特性是在不同温度下测量的。分析了势垒高度和异质结串联电阻的温度依赖性。构造了正在研究的异质结的能带图。异质结表面态的浓度估计为2.67×10〜(13)cm〜(–2)。已确定在隧道和发射模型中很好地描述了通过正向和反向偏置的n-TiN / n-Si异质结传输电流的主要机制。

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