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首页> 外文期刊>Separation and Purification Technology >~(29)Si NMR and Si2p XPS correlation in polysiloxane membranes prepared by plasma enhanced chemical vapor deposition
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~(29)Si NMR and Si2p XPS correlation in polysiloxane membranes prepared by plasma enhanced chemical vapor deposition

机译：等离子增强化学气相沉积制备的聚硅氧烷膜中的〜（29）Si NMR和Si2p XPS相关性

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摘要

Thin a-SiO_xC_yH_z membranes were eeposited from two different orgnaosilicon precursors, a linear one the octamethyltrisloxane (MDM) and a cyclic one the hexamethylcyclotrisiloxane (D3), in a low-frequency plasma polymerization process. the chemical structure of polysiloxane plasma materials was characterized using two differnt spectroscopic analyses: the X-ray Photoelectron Spectroscopy 9XPS) and the ~(29)Si solid-state Nuclear magnetic Resonance (NMR). Both techniques show that it is possible to synthesize a wide range of materials, more or less orgnaic and close to silicone-type conventional polymers, depending on whether the energetic characfteri of the plasma is low or high. The structural differentces between plasma films synthesized from MDM (PP-MDM films) and plasma materials deposited from D3 (PP-D3 films) are all the more pronounced that the plasma conditions are soft due to the better preservation of the monomer chmemical structure. the NMR analysis allows to display the presence of cyclic siloxane chains in PP-D3 layers whereas PP-MDM materials are exclusively composed of linear siloxane chains.
机译：在低频等离子体聚合过程中，从两种不同的有机硅前体中沉积了薄的a-SiO_xC_yH_z膜，其中一种是线性的八甲基三硅氧烷（MDM），另一种是六甲基环三硅氧烷（D3）。聚硅氧烷等离子体材料的化学结构通过两种不同的光谱分析进行了表征：X射线光电子能谱9XPS和〜（29）Si固态核磁共振（NMR）。两种技术都表明，可以合成多种材料，或多或少为有机质，并且接近于有机硅类常规聚合物，这取决于等离子体的高能特性。由MDM合成的等离子膜（PP-MDM膜）与由D3沉积的等离子材料（PP-D3膜）之间的结构差异更加明显，因为更好地保留了单体化学结构，等离子条件是柔软的。 NMR分析显示PP-D3层中存在环状硅氧烷链，而PP-MDM材料仅由线性硅氧烷链组成。

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