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Dielectric constant and breakdown field studies of electrostatic self-assembled materials

机译:静电自组装材料的介电常数和击穿场研究

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Electrical properties of electrostatic self-assembled (ESA) films were investigated using a conductive polymer and metal bar. These nanostructured polymeric films were fabricated on gold-coated glass slides using the ESA method. The thicknesses of the films were in the range 120-630 nm, and the films were obtained by depositing numbers of bilayers of negatively charged Poly s-119 (PS-119) or heparin and positively charged Poly(dially1dimethylammonlum chloride) (PDDA). Measurement electrodes were fabricated on the ESA films using conductive silver grease and a brass bar. Capacitance measurements were conducted to determine the dielectric constant of the ESA films over various temperature and frequency ranges at 1 mV and 15% relative humidity, while electric field breakdown tests were performed at 1000 Hz, 15% relative humidity and varying temperatures and voltages. The test results showed that dielectric constant values were between 1.8 and 2.4 and breakdown field values were approximately 9 kV mm(-1). Based on the test results, it is concluded that this is a technique that might prove useful in estimating the capacitance, dielectric constant and breakdown field values of nanostructured ESA films.
机译:使用导电聚合物和金属棒研究了静电自组装(ESA)膜的电性能。这些纳米结构的聚合物薄膜是使用ESA方法在镀金的载玻片上制成的。膜的厚度在120-630nm范围内,并且通过沉积一定数目的带负电的Poly s-119(PS-119)或肝素和带正电的聚(二烯丙基二甲基氯化铵)(PDDA)的双层来获得膜。使用导电银脂和黄铜棒在ESA膜上制作测量电极。进行电容测量以确定在1 mV和15%相对湿度的各种温度和频率范围内ESA膜的介电常数,同时在1000 Hz,15%相对湿度和变化的温度和电压下进行电场击穿测试。测试结果表明介电常数值在1.8到2.4之间,击穿场值大约为9 kV mm(-1)。根据测试结果,可以得出结论,该技术可能在估算纳米结构ESA薄膜的电容,介电常数和击穿场值方面很有用。

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