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TEOS based water repellent silica films obtained by a co-precursor sol-gel method

机译：通过共前体溶胶-凝胶法获得的TEOS基憎水二氧化硅薄膜

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摘要

The nature of interfaces between water and hydrophobic materials has been a subject of great interest. Experimental results from tetraethoxysilane (TEOS) based hydrophobic silica films synthesized by the two step sol–gel process using hexadecyltrimethoxysilane (HDTMS) as a co-precursor are described. The molar ratio of TEOS, methanol (MeOH), acidic water (0.001 M, oxalic acid), and basic water (8 M, NH_4OH) was kept constant at 1:66.66:6.76:6.66, and the molar ratio of HDTMS/TEOS (M) was varied from 0 to 22.9 × 10~(-2). The maximum contact angle of 125° was obtained for M = 22.9 × 10~(-2). It is observed that the water contact angle value on the HDTMS modified films remained stable at 125°, after heat treatment up to 235 ℃. However, the water contact angle value decreased to 52° in the case of unmodified films, indicating the improvement in the thermal stability using HDTMS as a co-precursor. The hydrophobic silica films retained their hydrophobicity up to a temperature of 235 ℃ and above this temperature the films became hydrophilic. The hydrophobic silica films were characterized by surface roughness studies, scanning electron microscopy (SEM), Fourier transform infrared (FTIR) spectroscopy, contact angle measurements, and % optical transmission.
机译：水和疏水性材料之间的界面性质一直是人们非常感兴趣的主题。描述了通过使用十六烷基三甲氧基硅烷（HDTMS）作为共前体的两步溶胶-凝胶法合成的基于四乙氧基硅烷（TEOS）的疏水性二氧化硅薄膜的实验结果。 TEOS，甲醇（MeOH），酸性水（0.001 M，草酸）和碱性水（8 M，NH_4OH）的摩尔比保持恒定在1：66.66：6.76：6.66，HDTMS / TEOS的摩尔比（M）在0到22.9×10〜（-2）之间变化。当M = 22.9×10〜（-2）时，最大接触角为125°。观察到，在经过高达235℃的热处理之后，HDTMS改性膜上的水接触角值保持稳定在125°。然而，在未改性膜的情况下，水接触角值降低至52°，表明使用HDTMS作为共前体可提高热稳定性。疏水性二氧化硅薄膜在高达235℃的温度下仍保持疏水性，而在此温度以上，薄膜变得亲水。通过表面粗糙度研究，扫描电子显微镜（SEM），傅立叶变换红外（FTIR）光谱，接触角测量和％光学透射率对疏水性二氧化硅膜进行了表征。

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