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首页> 外文期刊>Superconductor Science & Technology >Pulsed laser deposition of epitaxial YBa_2Cu_3O_(7-y)/oxide multilayers onto textured NiFe substrates for coated conductor applications
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Pulsed laser deposition of epitaxial YBa_2Cu_3O_(7-y)/oxide multilayers onto textured NiFe substrates for coated conductor applications

机译：外延YBa_2Cu_3O_（7-y）/氧化物多层膜的脉冲激光沉积到带纹理的NiFe衬底上以用于涂覆导体

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摘要

Pulsed laser depositions of double-buffer and triple-buffer YBa_2Cu_3O_(7-y) (YBCO)/Y_2O_3(YSZ)/CeO_2 heterostructures have been performed in situ onto commercially available biaxially textured NiFe 50 percent/50 percent tape. The deposition in the forming gas (4 percent H_2/Ar) from a CeO_2 target and the deposition in vacuum from a CeO_2: Pd composite target have been explored as two possible routes for cube-on-cube growth of the first buffer layer. The influence of the critical processing parameters on the texture is investigated and some of the issues involved in the reduction of NiO (111) and the formation of cube-on-cube NiO (200) growth are discussed. X-ray diffraction has been used for texture evaluation of the substrate and subsequent deposited layers. The substrate-buffer interface region has been studied by focused ion beam cross section electron microscopy. Both the buffers and YBCO layers show biaxial alignment with omega and phi scans having optimum YBCO full width at half maximum (FWHM) values of 4.3 deg and 8.8 deg, respectively. The morphology has been characterized using atomic force microscopy and scanning electron microscopy. The value of T_c (onset) has been measured by transport measurements and magnetic measurements performed in a dc SQUID magnetometer.
机译：双缓冲和三缓冲YBa_2Cu_3O_（7-y）（YBCO）/ Y_2O_3（YSZ）/ CeO_2异质结构的脉冲激光沉积已在可商购的双轴织构NiFe 50％/ 50％胶带上进行了现场沉积。已经研究了从CeO_2靶形成气体（4％H_2 / Ar）中的沉积和从CeO_2：Pd复合靶在真空中的沉积，这是第一缓冲层在立方体间生长的两种可能途径。研究了关键工艺参数对织构的影响，并讨论了减少NiO（111）和形成立方体对立方体NiO（200）生长所涉及的一些问题。 X射线衍射已用于评估基材和后续沉积层的织构。通过聚焦离子束截面电子显微镜研究了底物-缓冲液界面区域。缓冲层和YBCO层都显示了Ω和phi扫描的双轴对齐，具有最佳的YBCO半峰全宽（FWHM）值分别为4.3度和8.8度。形态已使用原子力显微镜和扫描电子显微镜表征。 T_c（初始值）的值已通过在直流SQUID磁力计中进行的传输测量和磁测量进行了测量。

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