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首页> 外文期刊>Philosophical magazine, B. Physics of condensed matter, electronic, optical, and magnetic properties >Material properties and interfacial composition of thin films of TiN and Ti(C, N) physically vapour-deposited on iron
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Material properties and interfacial composition of thin films of TiN and Ti(C, N) physically vapour-deposited on iron

机译:物理沉积在铁上的TiN和Ti(C,N)薄膜的材料特性和界面组成

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摘要

TiN and Ti(C, N) films were deposited on both Fe and a tool steel by two different physical vapour deposition techniques: electron-beam hollow cathode discharge and thermal are evaporation. The tribological behaviour of the coated samples were studied under dry-sliding conditions. The differences were explained by taking into account various properties of the films as well as the interfacial phenomena that occur at the film-substrate interface during the deposition step.
机译:TiN和Ti(C,N)膜通过两种不同的物理气相沉积技术沉积在Fe和工具钢上:电子束空心阴极放电和热蒸发。在干滑条件下研究了涂层样品的摩擦学行为。通过考虑膜的各种特性以及在沉积步骤中在膜-基底界面处发生的界面现象来解释差异。

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