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首页> 外文期刊>Physica Scripta: An International Journal for Experimental and Theoretical Physics >Optimization of 2H, 4H and 6H-SiC MESFETs for high-frequency applications
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Optimization of 2H, 4H and 6H-SiC MESFETs for high-frequency applications

机译:为高频应用优化2H,4H和6H-SiC MESFET

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摘要

Silicon carbide MESFET devices are well suited for high speed, high power and high temperature electronics due to high saturation velocity, high critical electrical field, good thermal conductivity and large band-gap. Optimization of a high performance device demands a substantial number of numerical simulations, where several different design parameters have to be investigated thoroughly. In this work, we optimize the geometry of lateral MESFETs for maximal unity current-gain frequency (f(T)) using iterative 2-dimensional simulations. We also present a comparison of performance for individually optimized devices, realized with lithographic resolutions ranging from 0.2 to 2 mum in different SiC polytypes. [References: 16]
机译:碳化硅MESFET器件具有高饱和速度,高临界电场,良好的导热性和较大的带隙,因此非常适合于高速,高功率和高温电子设备。高性能设备的优化需要大量的数值模拟,其中必须彻底研究几种不同的设计参数。在这项工作中,我们使用迭代二维仿真为最大单位电流增益频率(f(T))优化了横向MESFET的几何形状。我们还提供了针对单个优化器件的性能比较,该器件在不同SiC多型体中的光刻分辨率范围为0.2到2 mum。 [参考:16]

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