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Pressure and temperature dependent studies of GaNxAs1-x/GaAs quantum well structures

机译:GaNxAs1-x / GaAs量子阱结构的压力和温度依赖性研究

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The pressure and temperature dependence of quantum well transitions in GaNxAs1-x/GaAs quantum well structures with x(N) = 1.8% and various well widths grown by metal organic vapour phase epitaxy were studied by photomodulated reflectance (FR) spectroscopy. The quantum well transition energies and their pressure dependence can be well described by a ten-band k . p Hamiltonian. Comparing experiment and theory demonstrates that the band alignment of the quantum well structures is type I with a chemical valence band offset of about 30% +/- 5% for x(N) = 1.8%. The temperature coefficients of the quantum well states are to a good approximation independent of well width and considerably smaller than that of GaAs. [References: 18]
机译:通过光调制反射光谱研究了x(N)= 1.8%且金属有机气相外延生长的各种阱宽度的GaNxAs1-x / GaAs量子阱结构中量子阱跃迁的压力和温度依赖性。量子阱跃迁能及其压力依存关系可以用十个谱带k很好地描述。 p哈密顿量。比较实验和理论表明,量子阱结构的能带排列是I型,对于x(N)= 1.8%,化学价带偏移约为30%+/- 5%。量子阱态的温度系数具有良好的近似性,与阱宽度无关,并且比GaAs的温度系数小得多。 [参考:18]

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