...
首页> 外文期刊>Physica status solidi, B. Basic research >Role of native point defects and Ga diffusion on electrical properties of degenerate Ga-doped ZnO
【24h】

Role of native point defects and Ga diffusion on electrical properties of degenerate Ga-doped ZnO

机译:本征点缺陷和Ga扩散对简并Ga掺杂ZnO电性能的影响

获取原文
获取原文并翻译 | 示例
           

摘要

We used a complement of depth-resolved cathodoluminescence spectroscopy (DRCLS), X-ray photoemission spectroscopy (XPS), and Hall-effect measurements to demonstrate the interplay of Zn vacancy-related (V_(Zn)-R) defects with dopants in degenerately Ga-doped ZnO grown by pulsed laser deposition. DRCLS V_(Zn)-R/conduction band emission ratios relate to acceptor/donor concentrations, increasing rapidly for growth temperatures >400°C, evidently because Ga atoms are inhibited from incorporating efficiently on available V_Zn sites. Elemental XPS depth profiles reveal a temperature-dependent Ga interface segregation due to Ga bulk diffusion during growth. DRCLS Fermi level thresholds provide a useful indicator of carrier density, revealing depth variations in carrier density that anticorrelate with V_(Zn)-R densities on a nm scale, confirming the acceptor nature of V_(Zn)-R defects.
机译:我们使用了深度解析阴极发光光谱(DRCLS),X射线光电子能谱(XPS)和霍尔效应测量的补充,以证明简并的锌空位相关(V_(Zn)-R)缺陷与掺杂剂之间的相互作用通过脉冲激光沉积生长的Ga掺杂的ZnO。 DRCLS V_(Zn)-R /导带发射比与受体/施主浓度有关,在生长温度> 400°C时迅速增加,这显然是因为抑制了Ga原子有效地结合到可用的V_Zn位点上。 XPS元素深度剖面揭示了由于生长过程中Ga体扩散而导致的温度依赖性Ga界面偏析。 DRCLS费米能级阈值提供了载流子密度的有用指标,揭示了载流子密度的深度变化与纳米级的V_(Zn)-R密度反相关,从而确认了V_(Zn)-R缺陷的受体性质。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号