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首页> 外文期刊>Physica status solidi, B. Basic research >Dependence of the Raman spectrum characteristics on the number of layers and stacking orientation in few-layer graphene
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Dependence of the Raman spectrum characteristics on the number of layers and stacking orientation in few-layer graphene

机译：拉曼光谱特性对多层石墨烯中层数和堆叠方向的依赖性

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Few-layer graphene (FLG) samples prepared by two methods (chemical vapor deposition (CVD) followed by transfer onto SiO2/Si substrate and mechanical exfoliation) are characterized by combined optical contrast and micro-Raman mapping experiments. We examine the behavior of the integrated intensity ratio of the 2D and G bands (A(2D)/A(G)) and of the 2D band width (Gamma(2D)) as a function of the number of layers (N). For our mechanically exfoliated FLG, A(2D)/A(G) decreases and Gamma(2D) increases with N as expected for commensurately stacked FLG. For CVD FLG, both similar and opposite behaviors are observed and are ascribed to different stacking orders. For small (respectively, large) relative rotation angle between consecutive layers (theta), the values of the A(2D)/A(G) ratio is smaller (respectively, larger) and the 2D band is broader (respectively, narrower) than for single-layer graphene. Moreover, the A(2D)/A(G) ratio decreases (respectively, increases) and, conversely, Gamma(2D) increases (respectively, decreases) as a function of N for small (respectively, large) theta. An intermediate behavior has also been found and is interpreted as the presence of both small and large theta within the studied area. These results confirm that neither A(2D)/A(G) nor Gamma(2D) are definitive criteria to identify singlelayer graphene, or to count N in FLG. (C) 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
机译：通过结合光学对比和显微拉曼作图实验，表征了通过两种方法（化学气相沉积（CVD），然后转移到SiO2 / Si基底上并进行机械剥离）制备的几层石墨烯（FLG）样品。我们研究了2D和G波段的积分强度比（A（2D）/ A（G））和2D波段宽度（Gamma（2D））随层数（N）变化的行为。对于我们的机械剥落的FLG，A（2D）/ A（G）减少，而Gamma（2D）随着N的增加而增加，这与相应堆叠的FLG预期相同。对于CVD FLG，观察到相似和相反的行为，并且归因于不同的堆叠顺序。对于连续层之间的较小（分别为大）相对旋转角度（θ），A（2D）/ A（G）之比的值小于（分别为大），并且2D波段比（分别为窄）宽用于单层石墨烯。此外，A（2D）/ A（G）之比减小（分别增加），反之，对于小（分别大）θ，Gamma（2D）作为N的函数增加（分别减小）。还发现了一种中间行为，并被解释为在研究区域内同时存在小θ和大θ。这些结果证实，A（2D）/ A（G）和Gamma（2D）都不是确定单层石墨烯或计数FLG中N的确定标准。 （C）2015 WILEY-VCH Verlag GmbH＆Co.KGaA，Weinheim

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