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In-redistribution in a GaInN quantum well upon thermal annealing

机译:热退火后GaInN量子阱中的再分布

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A GaInN quantum-well structure with an average In-concentration of 16% grown by metal organic chemical vapor deposition (MOCVD) on a SiC substrate. was studied by transmission electron microscopy (TEM) and photoluminescence spectroscopy (PL) before and after all one-hour annealing treatment at 980 degreesC. Due to the heat treatment, the formation of In-rich clusters with extensions between 10 run and 100 nm and In-concentrations above 80% was observed. Nevertheless, the PL exhibits a blue shift in the PL-peak energy of about 90 meV compared to the as grown sample and do not show a significant influence of the In-rich clusters oil the emission wavelength. [References: 12]
机译:通过在SiC衬底上进行金属有机化学气相沉积(MOCVD)生长的平均In浓度为16%的GaInN量子阱结构。在980℃下进行一小时的退火处理之前和之后,通过透射电子显微镜(TEM)和光致发光光谱学(PL)研究了X射线衍射。由于进行了热处理,观察到形成了In富集团簇,其延伸范围在10nm至100nm之间,并且In浓度超过80%。然而,与生长的样品相比,PL在PL峰能量中表现出约90 meV的蓝移,并且没有显示出富含In的团簇对发射波长的显着影响。 [参考:12]

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