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Application of genetic algorithms for characterization of thin layered materials by glancing incidence X-ray reflectometry

机译:遗传算法在掠射X射线反射仪表征薄层材料中的应用

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摘要

A genetic algorithm for characterization of thin-layered materials by glancing incidence X-ray reflectometry is proposed. For both simulated and measured data good fits are obtained within a single run. This reduces the amount of human effort and expertise necessary for analyzing reflectivity measurements which makes genetic algorithms an attractive alternative to methods currently used. (C) 1998 Elsevier Science B.V. All rights reserved. [References: 19]
机译:提出了一种通过掠入射X射线反射法表征薄层材料的遗传算法。对于模拟和测量数据,一次运行即可获得良好的拟合度。这减少了分析反射率测量所需的人力和专业知识,从而使遗传算法成为当前使用的方法的有吸引力的替代方法。 (C)1998 Elsevier Science B.V.保留所有权利。 [参考:19]

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