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首页> 外文期刊>Physica, C. Superconductivity and its applications >Effect of substrate roughness on IBAD-GZO template layer
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Effect of substrate roughness on IBAD-GZO template layer

机译：基材粗糙度对IBAD-GZO模板层的影响

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摘要

Gd2Zr2O7 (GZO) layers were deposited on rolled, mirror like polished and electropolished Ni-based alloy (Inconel) tapes by the ion-beam-assisted deposition (1BAD) method and were investigated especially in terms of the effect of substrate roughness on the crystal grain alignment. Their surface roughness, Ra, was 7.6-12.3 nm, 4.3-4.7 nm and 1.4-3.4 nm, respectively. The deposition time was varied from 1 h to 6 h. Crystalline alignment of these films was observed by X-ray diffraction (XRD) and cross-sectional transmission electron microscope (TEM). The grain alignment of the IBAD-GZO was improved by using flat surfaces. GZO film on the electropolished substrate got to align from closer point near the interface than that on rolled substrates. (c) 2006 Published by Elsevier B.V.
机译：通过离子束辅助沉积（1BAD）方法将Gd2Zr2O7（GZO）层沉积在轧制，镜面抛光和电抛光的镍基合金（Inconel）胶带上，并特别针对衬底粗糙度对晶体的影响进行了研究晶粒排列。它们的表面粗糙度Ra分别为7.6-12.3nm，4.3-4.7nm和1.4-3.4nm。沉积时间从1小时到6小时不等。通过X射线衍射（XRD）和截面透射电子显微镜（TEM）观察这些膜的晶体取向。通过使用平坦表面，IBAD-GZO的晶粒排列得到改善。电抛光基板上的GZO膜必须比滚动基板上更靠近界面对齐。 （c）2006年由Elsevier B.V.发布

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