...
  • 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Physica, C. Superconductivity and its applications >Effect of microstructure on the electrical properties of YBCO interface-engineered Josephson junctions
【24h】

Effect of microstructure on the electrical properties of YBCO interface-engineered Josephson junctions

机译：微观结构对YBCO界面工程约瑟夫逊结电性能的影响

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

The microstructure of interface engineered ramp-edge Josephson junctions in YBCO has been studied by transmission electron microscopy (TEM). The junctions are distinctly different from the structures found the structures found in heterophase SNS junctions. This structural difference can be directly related to the improved electrical properties of interface engineered junctions. The plasma treatment used in the interface engineering method forms a continuous barrier layer of 2 to 3 nm in thickness, much thinner than the deposited heterophase layers in SNS junctions. The layer, which separates the two YBCO layers, is crystalline, but has a crystal structure different from YBCO. The main factors responsible for the improved junction properties and their good reproducibility are: small barrier thickness, small thickness variation, weak interfacial strain fields, flat and nearly defect-free/YBCO interfaces and good epitaxy of the second YBCO layer with few defects. Possible mechanisms for the formation of the large junction resistance are discussed.
机译：通过透射电子显微镜（TEM）研究了YBCO中界面工程斜边约瑟夫森结的微观结构。该结明显不同于在异相SNS结中发现的结构。这种结构差异可直接与界面工程结的改善的电气性能有关。界面工程方法中使用的等离子体处理形成了厚度为2到3纳米的连续势垒层，比SNS结中沉积的异相层薄得多。分隔两个YBCO层的层是晶体，但具有与YBCO不同的晶体结构。导致改善接合性能和良好重现性的主要因素是：较小的势垒厚度，较小的厚度变化，较弱的界面应变场，平坦且几乎无缺陷的YBCO界面以及具有很少缺陷的第二YBCO层的良好外延。讨论了形成大结电阻的可能机制。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号