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Performance of AlGaN/GaN High Electron Mobility Transistors with AlSiN Passivation

机译:具有alsiN钝化的alGaN / GaN高电子迁移率晶体管的性能

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This program was focused on the development of alternative and superior dielectric passivations to AlGaN/GaN HEMT transistors for mm- wave operation. A new process was developed to deposit by LPCVD the composite dielectric of AlSiN containing as much as 10 atomic % by weight of aluminum. This dielectric partially depletes the 2DEG which has be effectively used in place of a gate extension. The resulting devices do not display non-linear increases in access resistances, and they deliver state-of-the-art power performance at large drain bias at frequencies up to 10 and 35 GHz.

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