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Studying charge-trapping defects within the silicon lattice of a p-channel CCD using a single-trap “pumping” technique.

机译:使用单阱“泵浦”技术研究p沟道CCD的硅晶格内的电荷俘获缺陷。

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摘要

The goals of future space missions such as Euclid require unprecedented positional accuracy from the responsible detector. Charge coupled devices (CCDs) can be manufactured with exceptional charge transfer properties; however the harsh radiation environment of space leads to damage within the silicon lattice, predominantly through proton collisions. The resulting lattice defects can trap charge, degrading the positional accuracy and reducing the useful operating time of a detector. Mitigation of such effects requires precise knowledge of defects and their effects on charge transfer within a CCD. We have used the technique of single-trap ``pumping'' to study two such charge trapping defects; the silicon divacancy and the carbon interstitial, in a p-channel CCD. We show this technique can be used to give accurate information about trap parameters required for radiation damage models and correction algorithms. We also discuss some unexpected results from studying defects in this way.
机译:诸如Euclid之类的未来太空任务的目标需要负责任的探测器提供前所未有的位置精度。电荷耦合器件(CCD)可以制造成具有出色的电荷转移特性;然而,恶劣的空间辐射环境主要通过质子碰撞导致硅晶格内部的损坏。产生的晶格缺陷会捕获电荷,从而降低位置精度并减少检测器的可用工作时间。减轻这种影响需要精确了解缺陷及其对CCD内电荷转移的影响。我们已经使用单阱``泵浦''技术研究了两个这样的电荷陷阱缺陷; p通道CCD中的硅空位和碳间隙。我们证明了该技术可用于提供有关辐射损伤模型和校正算法所需的陷阱参数的准确信息。我们还讨论了以这种方式研究缺陷带来的一些出乎意料的结果。

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