首页> 外国专利> RESONANT TUNNELING DEVICES INCLUDING TWO-DIMENSIONAL SEMICONDUCTOR MATERIALS AND METHODS OF DETECTING PHYSICAL PROPERTIES USING THE SAME

RESONANT TUNNELING DEVICES INCLUDING TWO-DIMENSIONAL SEMICONDUCTOR MATERIALS AND METHODS OF DETECTING PHYSICAL PROPERTIES USING THE SAME

机译:包含二维半导体材料的谐振隧道设备和使用相同方法检测物理性能的方法

摘要

A resonant tunneling device includes a first two-dimensional semiconductor layer (131) including a first two-dimensional semiconductor material, like a transition metal dichalcogenide (TMDC or TMD), a first insulating, preferably also a two-dimensional, layer (140), on the first two-dimensional semiconductor layer; and a second two-dimensional semiconductor layer (132) on the first insulating layer and including a second two-dimensional semiconductor material of a same kind as the first two-dimensional semiconductor material. The substrate (110) may comprise a back gate and the two-dimensional semiconductor layers are connected to first and second electrodes (171, 172), which may comprise graphene (150 in Fig. 13).
机译:谐振隧穿设备包括第一二维半导体层(131),该第一二维半导体层(131)包括第一二维半导体材料,例如过渡金属二卤化硅(TMDC或TMD),第一绝缘层,优选也是二维绝缘层(140)在第一二维半导体层上;第二二维半导体层(132)在第一绝缘层上并且包括与第一二维半导体材料相同种类的第二二维半导体材料。衬底(110)可以包括背栅,并且二维半导体层连接到可以包括石墨烯(图13中的150)的第一和第二电极(171、172)。

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