首页> 外国专利> METHOD FOR REDUCING RESIDUAL STRESS OF GLASS SUBSTRATE, AND DEVICE FOR REDUCING RESIDUAL STRESS OF GLASS SUBSTRATE

METHOD FOR REDUCING RESIDUAL STRESS OF GLASS SUBSTRATE, AND DEVICE FOR REDUCING RESIDUAL STRESS OF GLASS SUBSTRATE

机译:减少玻璃基质残余应力的方法及减少玻璃基质残余应力的装置

摘要

The present invention relates to a method for reducing residual stress of a glass substrate, and a device for reducing residual stress of a glass substrate. The residual stress of the glass substrate integrated with a material having low heat resistance such as a resin is reduced. In addition, the residual stress can be reduced even before destruction of the glass substrate, which is usually broken within a few minutes due to high residual stress. The method for reducing residual stress of the glass substrate (G) comprises a laser beam irradiation step for irradiating each of a plurality of portions of the high residual stress portion of the glass substrate (G) repeatedly in a short period of time with laser light so as to pseudo-simultaneously irradiate the laser light to the plurality of portions.;COPYRIGHT KIPO 2019
机译:减少玻璃基板的残余应力的方法和装置技术领域本发明涉及一种减小玻璃基板的残余应力的方法和一种减小玻璃基板的残余应力的装置。降低了与诸如树脂的具有低耐热性的材料集成的玻璃基板的残余应力。另外,即使在破坏玻璃基板之前,也可以减小残留应力,由于高残留应力,玻璃基板通常在几分钟之内破裂。减少玻璃基板(G)的残余应力的方法包括激光束照射步骤,该激光束照射步骤用于在短时间内用激光重复照射玻璃基板(G)的高残余应力部分的多个部分中的每一个。以便将激光伪伪地照射到多个部分。; COPYRIGHT KIPO 2019

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