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Pressure Control Strategies to Provide Uniform Treatment Streams in the Manufacture of Microelectronic Devices
Pressure Control Strategies to Provide Uniform Treatment Streams in the Manufacture of Microelectronic Devices
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机译:在微电子器件制造中提供统一处理流的压力控制策略
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摘要
The present invention provides techniques to more accurately control the process performance of treatments in which microelectronic substrates are treated by pressurized fluids that are sprayed onto the substrates in a vacuum process chamber. control strategies are used that adjust mass flow rate responsive to pressure readings in order to hold the pressure of a pressurized feed constant. In these embodiments, the mass flow rate will tend to vary in order to maintain pressure uniformity.
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