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A method of producing a multilayer epitaxial p-i-n structure based on GaAs-GaAlAs compounds by liquid phase epitaxy

机译:一种基于GaAs-GaAlAs化合物的液相外延制备多层外延p-i-n结构的方法

摘要

FIELD: chemistry.SUBSTANCE: invention refers to the technology of multilayer semiconductor structures of compounds ABby the method of liquid-phase epitaxy, and more particularly to methods of manufacturing semiconductor p-i-n structures in the system GaAs-GaAlAs for power electronic equipment. When the structure is grown to the temperature range of inversion of the silicon impurity in gallium arsenide of 885-895°C, the epitaxial process is carried out in an atmosphere of high-purity inert gas, and then to the temperature of the epitaxy termination - in an atmosphere of high-purity hydrogen.EFFECT: increase in the values of the reverse breakdown voltage simultaneously with the elimination of thyristor regions on the current-voltage characteristics of the structures obtained.1 cl
机译:技术领域本发明涉及通过液相外延法的化合物AB的多层半导体结构的技术,并且更具体地涉及在用于电力电子设备的GaAs-GaAlAs系统中制造半导体p-i-n结构的方法。当结构生长到885-895°C的砷化镓中的硅杂质转化的温度范围时,在高纯度惰性气体气氛中进行外延工艺,然后到外延终止温度-在高纯氢气氛中。效果:在消除晶闸管区域的同时,增加反向击穿电压的值对所得结构的电流-电压特性的影响1 cl

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