首页> 外国专利> A method of manufacturing a rare earth powder or sputtering target containing neodymium, iron, boron as a main component, a powder composed of the rare earth element or a sputtering target, a thin film for a rare earth magnet mainly comprising neodymium, iron, boron or a method for producing the same

A method of manufacturing a rare earth powder or sputtering target containing neodymium, iron, boron as a main component, a powder composed of the rare earth element or a sputtering target, a thin film for a rare earth magnet mainly comprising neodymium, iron, boron or a method for producing the same

机译:一种以钕,铁,硼为主要成分的稀土粉末或溅射靶的制造方法,由稀土元素或溅射靶构成的粉末,以钕,铁,硼为主成分的稀土磁铁用薄膜或生产方法

摘要

The present invention relates to a process for producing an alloy ingot by dissolving and casting a raw material mainly containing neodymium, iron, and boron in a vacuum to make an oxygen ingot concentration in an ingot 300 ppm or less, Iron and boron as main components, characterized in that the powder is finely pulverized by a gas atomization method using an active gas so that the concentration of oxygen contained in the powder is 500 ppm or less. In the preparation of a rare earth powder or a sputter target essentially consisting of neodymium, iron and boron, by reducing moisture adhering to the raw material and reducing the oxygen concentration in the target, it is possible to stabilize by the sputtering method or the pulsed laser deposition method It is possible to improve the magnetic characteristics of the rare earth magnet thin film and improve the productivity.
机译:本发明涉及一种合金锭的制造方法,该合金锭通过在真空中溶解和铸造主要包含钕,铁和硼的原料以使锭中的氧锭浓度为300ppm以下,以铁和硼为主要成分来制造合金锭的方法。其特征在于,通过使用活性气体的气体雾化法将粉末细粉碎,使得粉末中所含的氧气浓度为500ppm以下。在制备主要由钕,铁和硼组成的稀土粉末或溅射靶时,通过减少附着在原料上的水分并降低靶中的氧浓度,可以通过溅射法或脉冲法使其稳定。激光沉积法可以改善稀土磁体薄膜的磁特性并提高生产率。

著录项

  • 公开/公告号JPWO2015019513A1

    专利类型

  • 公开/公告日2017-03-02

    原文格式PDF

  • 申请/专利权人 JX金属株式会社;

    申请/专利号JP20150530657

  • 发明设计人 澤渡 広信;

    申请日2013-12-04

  • 分类号B22F9/08;C22C33/02;H01F1/057;H01F1/06;H01F41/18;C23C14/34;C23C14/24;C23C14/14;C22C38;

  • 国家 JP

  • 入库时间 2022-08-21 13:53:39

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