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MICROELECTROMECHANICAL DEVICE HAVING SENSITIVITY TO OUTSTANDING MECHANICAL SOLICITATION
MICROELECTROMECHANICAL DEVICE HAVING SENSITIVITY TO OUTSTANDING MECHANICAL SOLICITATION
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机译：微机电装置具有超越机械要求的敏感性
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摘要
Micro-electromechanical device made in a semiconductor substrate and comprising at least one main mass (1) able to move in rotation about an axis of rotation (4) parallel to the plane of the substrate under the effect of a first mechanical stress. The device further comprises at least one mechanical detection assembly formed of: an intermediate mass (51, 52) connected to an anchoring zone (2) via mechanical connection means (61, 62), allowing a displacement the intermediate mass (51, 52) parallel to the plane of the substrate under the effect of a second mechanical stress inducing a displacement of the device along an axis X parallel to the plane of the substrate and perpendicular to the axis of rotation (4); and - a strain gauge (71, 72) secured to the main mass (1) via a first point of attachment (711, 721) and secured to the intermediate mass (51, 52) via a second point of fastener (712, 722), the displacements of the first attachment point (711, 721) and the second attachment point (712, 722) being of substantially identical directions and different amplitudes under the effect of the first solicitation , and substantially identical directions and amplitudes substantially equal under the effect of the second bias.
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