首页> 外国专利> HIGH QUALITY PHYSICAL DESIGN FOR MONOLITHIC THREE-DIMENSIONAL INTEGRATED CIRCUITS (3D IC) USING TWO-DIMENSIONAL INTEGRATED CIRCUIT (2D IC) DESIGN TOOLS

HIGH QUALITY PHYSICAL DESIGN FOR MONOLITHIC THREE-DIMENSIONAL INTEGRATED CIRCUITS (3D IC) USING TWO-DIMENSIONAL INTEGRATED CIRCUIT (2D IC) DESIGN TOOLS

机译:使用二维集成电路(2D IC)设计工具对全尺寸三维集成电路(3D IC)进行高质量的物理设计

摘要

A method of designing a multi-tier three-dimensional integrated circuit (3D IC) is provided that allows the use of two-dimensional integrated circuit (2D IC) design tools. When a 2D IC design tool is used, a macro for each of the tiers indicating areas available and unavailable for placement of circuit elements in each tier is created, and the macros are superimposed on one another. Circuit elements to be implemented in the 3D IC, such as logic cells and interconnects, are shrunk and then placed and repopulated on the superimposed macro. The repopulated circuit elements on the superimposed macro are then partitioned into tiers. Monolithic inter-tier via (MIV) placement and tier-to-tier routing are designed to provide electrical connections between circuit elements in different tiers. Power, performance and area (PPA) optimization may also be performed to optimize the 3D IC layout.
机译:提供了一种设计多层三维集成电路(3D IC)的方法,该方法允许使用二维集成电路(2D IC)设计工具。当使用2D IC设计工具时,针对每个层的宏被创建,指示在每个层中可用于和不可用于放置电路元件的区域,并且该宏彼此叠加。缩小3D IC中要实现的电路元件(例如逻辑单元和互连),然后将其放置并重新放置在叠加的宏上。然后,将叠加宏上重新填充的电路元件划分为多个层。单片层间过孔(MIV)放置和层到层布线设计用于在不同层的电路元件之间提供电连接。还可进行功率,性能和面积(PPA)优化,以优化3D IC布局。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号