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Active region patterning in double patterning processes
Active region patterning in double patterning processes
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机译：双图案化工艺中的有源区图案化
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摘要
A method includes forming an SRAM cell including a first and a second pull-up transistor and a first and a second pull-down transistor. The step of forming the SRAM cell includes forming a first and a second active region of the first and the second pull-up transistors using a first lithography mask, and forming a third and a fourth active region of the first and the second pull-down transistors using a second lithography mask.
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