首页> 外国专利> GaN-BASED LIGHT EMITTING DIODE USING A GaN SUBSTRATE AS A GROWTH SUBSTRATE AND A LIGHT EMITTING DEVICE INCLUDING THE SAME

GaN-BASED LIGHT EMITTING DIODE USING A GaN SUBSTRATE AS A GROWTH SUBSTRATE AND A LIGHT EMITTING DEVICE INCLUDING THE SAME

机译:使用GaN衬底作为生长衬底的GaN基发光二极管和包括该衬底的发光器件

摘要

PURPOSE: A GaN-based light emitting diode and a light emitting device including the same are provided to reduce optical interference between the light emitting diodes by arranging the light emitting diodes with parallelogram shapes. ;CONSTITUTION: A GaN-based first contact layer (119) is located on a GaN substrate (111). A GaN-based second contact layer (143) is located on the upper surface of the first contact layer. An active layer of a multiple quantum well structure is located between the first contact layer and the second contact layer. The GaN substrate has a parallelogram shape with an acute angle and an obtuse angle. A middle temperature buffer layer (113) is located between the GaN substrate and the first contact layer. The middle temperature buffer layer is grown on the GaN substrate at growth temperatures between 700 and 800 degrees Centigrade.;COPYRIGHT KIPO 2013
机译:目的:提供一种GaN基发光二极管和包括该GaN基发光二极管的发光器件,以通过将发光二极管布置为平行四边形形状来减少发光二极管之间的光学干扰。组成:基于GaN的第一接触层(119)位于GaN衬底(111)上。 GaN基第二接触层(143)位于第一接触层的上表面上。多量子阱结构的有源层位于第一接触层和第二接触层之间。 GaN衬底具有具有锐角和钝角的平行四边形形状。中间温度缓冲层(113)位于GaN衬底和第一接触层之间。在700到800摄氏度之间的生长温度下,在GaN衬底上生长中间温度缓冲层。; COPYRIGHT KIPO 2013

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