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FABRICATION METHOD OF CUXO BY 2 STEP ATOMIC LAYER DEPOSITION
FABRICATION METHOD OF CUXO BY 2 STEP ATOMIC LAYER DEPOSITION
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机译：两步原子层沉积制备CUXO的方法
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摘要
PURPOSE: a kind of copper oxide layer manufacturing method manufactures the first or second copper oxide layer and depth selectively by two step atomic layer deposition methods to control entire film. ;CONSTITUTION: a kind of copper oxide layer manufacturing method passes through two step atomic layer deposition method following steps: forming copper atom layer on substrate, utilizes copper precursors gas and reaction gas; It is used with copper oxide layer is formed by the oxidation of gasoline of copper oxide atomic layer, which executes following steps: absorbing copper precursor gas on substrate; Copper precursors gas is cleaned from settling chamber; Forming copper atom positioned at the substrate makes reaction gas enter plasma with reaction gas in settling chamber; With cleaning reaction gas from settling chamber. ;The 2013 of copyright KIPO submissions;[Reference numerals] (AA) Copper precursor gas; (BB, DD, FF) is purged; (CC) plasma of hydrogen; Oxidizing gas (EE); (GG) first step; Second step (HH)
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