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PELLICLE HAVING A BUFFER ZONE AND A PHOTOMASK STRUCTURE HAVING THE PELLICLE THEREON CAPABLE OF ENSURING THE SURFACE FLATNESS AND OPTICAL PATTERN UNIFORMITY OF THE PHOTOMASK STRUCTURE
PELLICLE HAVING A BUFFER ZONE AND A PHOTOMASK STRUCTURE HAVING THE PELLICLE THEREON CAPABLE OF ENSURING THE SURFACE FLATNESS AND OPTICAL PATTERN UNIFORMITY OF THE PHOTOMASK STRUCTURE
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机译：具有缓冲带和光掩膜结构的细胞因此具有能够确保光掩膜结构的表面平整度和光学图案均匀性的能力
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摘要
PURPOSE: A pellicle and a photomask structure having the pellicle thereon are provided to disperse pressures applied to the upper surface of the photomask from a frame by forming a buffer zone in the frame.;CONSTITUTION: A photomask structure(50) includes a photomask(44) and a pellicle(40). Optical patterns(48) are formed on the upper surface of the photomask. The pellicle covers the upper surface of the photomask with the optical patterns. The pellicle includes a rectangular frame and a buffer zone. The buffer zone divides the lower surface of the frame into a plurality of regions. The buffer zone removes a part of the lower surface, internal surface, and external surface of the frame. The upper surface of the frame remains. The frame includes sides, and the buffer zone is formed on one of the sides.;COPYRIGHT KIPO 2013
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