首页> 外国专利> One of one or more instructions for execution by one or more processors executing a method for forming a lithographic mask layout, an apparatus for forming a lithographic mask layout, and a method for forming a lithographic mask layout A computer readable medium containing one or more sequences

One of one or more instructions for execution by one or more processors executing a method for forming a lithographic mask layout, an apparatus for forming a lithographic mask layout, and a method for forming a lithographic mask layout A computer readable medium containing one or more sequences

机译：由一个或多个处理器执行的一个或多个指令中的一个或多个指令中的一个，所述处理器执行用于形成光刻掩模版图的方法，用于形成光刻掩模版图的装置以及用于形成光刻掩模版图的方法。包含一个或多个序列的计算机可读介质。

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摘要

Provided is a method and system for developing a lithographic mask layout. The lithographic mask layout is adapted for configuring an array of micro-mirrors in a maskless lithography system. The method includes generating an ideal mask layout representative of image characteristics associated with a desired image. Next, an equivalent mask is produced in accordance with an average intensity of the ideal mask layout.

机译：提供了一种用于开发光刻掩模版图的方法和系统。光刻掩模布局适于在无掩模光刻系统中配置微镜阵列。该方法包括生成代表与期望图像相关联的图像特性的理想掩模布局。接下来，根据理想掩模布局的平均强度产生等效掩模。

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公开/公告号JP5147380B2

专利类型
公开/公告日2013-02-20

原文格式PDF
申请/专利权人エーエスエムエルホールディングエヌ．ブイ．;
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申请/专利号JP20070326579
发明设计人ナビラババ－アリ;
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申请日2007-12-18
分类号H01L21/027;G03F7/20;
国家 JP
入库时间 2022-08-21 16:54:56

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