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Silicon carbide bipolar junction transistor having a silicon carbide protective layer on the base region and a method of manufacturing the same

机译:在基极区域上具有碳化硅保护层的碳化硅双极结型晶体管及其制造方法

摘要

PROBLEM TO BE SOLVED: To provide a bipolar junction transistor (BJT) comprising a silicon carbide (SiC) collector layer of first conductivity type an epitaxial silicon carbide base layer of second conductivity type on the silicon carbide collector layer, and an epitaxial silicon carbide emitter mesa of the first conductivity type on the epitaxial silicon carbide base layer.;SOLUTION: In this bipolar junction transistor, an epitaxial silicon carbide passivation layer 350 of the first conductivity type is provided on at least a portion of the epitaxial silicon carbide base layer 320 outside the silicon carbide emitter mesa. In addition, the epitaxial silicon carbide passivation layer can be configured to deplete fully at zero device bias.;COPYRIGHT: (C)2007,JPO&INPIT
机译:解决的问题:提供一种双极结型晶体管(BJT),该双极结型晶体管包括第一导电类型的碳化硅(SiC)集电极层,在碳化硅集电极层上的第二导电类型的外延碳化硅基极层以及外延碳化硅发射极在外延碳化硅基层上具有第一导电类型的台面;解决方案:在该双极结型晶体管中,在外延碳化硅基层320的至少一部分上提供第一导电类型的外延碳化硅钝化层350在碳化硅发射极台面之外。此外,外延碳化硅钝化层可以配置为在零器件偏压下完全耗尽。;版权所有:(C)2007,JPO&INPIT

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