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POROUS SILICON NITRIDE CERAMIC COMPOSITION HAVING HIGH POROSITY AND A MANUFACTURING METHOD OF SILICON NITRIDE CERAMICS USING THEREOF CAPABLE OF OBTAINING A FILTER FOR SILICON NITRIDE DUST COLLECTORS HAVING A HIGH POROSITY
POROUS SILICON NITRIDE CERAMIC COMPOSITION HAVING HIGH POROSITY AND A MANUFACTURING METHOD OF SILICON NITRIDE CERAMICS USING THEREOF CAPABLE OF OBTAINING A FILTER FOR SILICON NITRIDE DUST COLLECTORS HAVING A HIGH POROSITY
PURPOSE: A porous silicon nitride ceramic composition having high porosity and a manufacturing method of silicon nitride ceramics using thereof are provided to enhance aspect ratio, density, gas porosity, and modulus of rupture of the silicon nitride ceramic by containing yttria(Y2O3), alumina(Al2O3), yttria-alumina composite(Y3Al5O12), and trioxide calcium(CaCO3) in silicon as sintering gradient materials.;CONSTITUTION: A porous silicon nitride ceramic composition having high porosity comprises 0.1-1.5 wt% of yttria(Y2O3), 0.1-1.0 wt% of alumina(Al2O3), 1.5-2.5 wt% of yttria alumina complex(Y2Al5O12), and 1.5-2.5 wt% of trioxide calcium(CaCO3) in 100% of silicon. A manufacturing method of the yttria alumina complex comprises a step of measuring yttria and alumina in a molar ratio of 3:5 and reacting at 1300-1500 deg. Celsius for 2-6 hours. A manufacturing method of the silicon nitride ceramic comprises the following steps: measuring and mill-mixing yttria(Y2O3), alumina(Al2O3), yttria alumina complex(Y3Al5O12), and trioxide calcium(CaCO3) as sintering gradient materials and manufacturing a silicon nitride ceramic composition(s10); drying and molding the silicon nitride ceramic composition(s20); nitriding by heat treating the molded product under nitrogen atmosphere(s30); and manufacturing the silicon nitride by sintering the nitride silicon nitride under nitrogen atmosphere(s40).;COPYRIGHT KIPO 2012
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机译：用途：提供一种具有高孔隙率的多孔氮化硅陶瓷组合物和使用其的氮化硅陶瓷的制造方法，以通过包含氧化钇（Y 2 O 3），氧化铝来提高氮化硅陶瓷的长宽比，密度，气体孔隙率和断裂模量。 （Al2O3），氧化钇-氧化铝复合材料（Y3Al5O12）和硅中的三氧化钙（CaCO3）作为烧结梯度材料;组成：具有高孔隙率的多孔氮化硅陶瓷组合物，占氧化钇（Y2O3）的0.1-1.5 wt％，0.1在100％的硅中，-1.0 wt％的氧化铝（Al2O3），1.5-2.5 wt％的氧化钇氧化铝配合物（Y2Al5O12）和1.5-2.5 wt％的三氧化钙（CaCO3）。氧化钇氧化铝配合物的制造方法包括以3：5的摩尔比测量氧化钇和氧化铝并在1300-1500度下反应的步骤。摄氏2-6小时。氮化硅陶瓷的制造方法包括以下步骤：测量并研磨混合作为烧结梯度材料的氧化钇（Y 2 O 3），氧化铝（Al 2 O 3），氧化钇铝配合物（Y 3 Al 5 O 12）和三氧化钙（CaCO 3）并制造氮化硅。陶瓷成分（s10）;干燥并模制氮化硅陶瓷组合物（s20）;在氮气氛下通过热处理模制产品进行氮化（S30）;在氮气氛下烧结氮化硅氮化物来制造和制造氮化硅（s40）。; COPYRIGHT KIPO 2012
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