PLASMA ETCHING METHOD, PLASMA ETCHING DEVICE, AND METHOD FOR PRODUCING PHOTONIC CRYSTAL

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• 2. 耐等离子刻蚀陶瓷体及其制造方法、等离子刻蚀设备 [P] . 中国专利： CN105777079A . 2016-07-20
• 3. Plasma etching method, plasma etching device, and method for producing photonic crystal [P] . 美国专利： US8986558B2 . 2015-03-24

  机译： 等离子蚀刻方法，等离子蚀刻装置及光子晶体的制造方法

• 4. PLASMA ETCHING METHOD, PLASMA ETCHING DEVICE AND PHOTONIC CRYSTAL MANUFACTURING METHOD [P] . 欧洲知识产权局专利： EP2333821A4 . 2014-07-30

  机译： 等离子刻蚀方法，等离子刻蚀装置和光子晶体制造方法

• 5. PLASMA ETCHING METHOD, PLASMA ETCHING DEVICE AND PHOTONIC CRYSTAL MANUFACTURING METHOD [P] . 欧洲知识产权局专利： EP2333821A1 . 2011-06-15

  机译： 等离子刻蚀方法，等离子刻蚀装置和光子晶体制造方法

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• 2. A one-pot method for controlled synthesis and selective etching of organic-inorganic hybrid perovskite crystals [J] . Yu Hou, Mengjiong Chen, Hongwei Qiao, 天然气化学（英文版） . 2019,第006期
• 3. Development of a radiographic method for measuring the discrete spectrum of the electron beam from a plasma focus device [J] . Neda SHAMSIAN, Babak SHIRANI BIDABADI, Hosein PIRJAMADI 等离子体科学和技术（英文版） . 2017,第007期
• 4. InP Etching by HI/Xe Inductively Coupled Plasma for Photonic-Crystal Device Fabrication [J] . Toshihide IDE, Jun-ichi HASHIMOTO, Kengo NOZAKI, Japanese Journal of Applied Physics. Part 2, Letters & Express Letters . 2006,第1a3期
• 5. SOI planar photonic crystal fabrication: Etching through SiO_2/Si/SiO_2 layer systems using fluorocarbon plasmas [J] . A.P. Milenin, C. Jamois, T. Geppert, Microelectronic Engineering . 2005,第1期
• 6. Sidewall passivation assisted by a silicon coverplate during Cl_2-H_2 and HBr inductively coupled plasma etching of InP for photonic devices [J] . S. Bouchoule, G. Patriarche, S. Guilet, Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures . 2008,第2期
• 7. Technological problems in forming Si waveguide lamellar diffraction gratings and 2D photonic crystals by plasma and wet etching of Si [C] . Aleksandr I. Ilin, Vladimir T. Volkov, Oleg V. Trofimov, IEEE International Conference on Nanotechnology . 2015
• 8. High density plasma etching of wide bandgap semiconductor materials for fabricating novel devices. [D] . Khan, Farid Ahmed. 2004
• 9. Silicon-based photonic crystals fabricated using proton beam writing combined with electrochemical etching method [O] . Zhiya Dang, Mark BH Breese, Gonzalo Recio-Sánchez, 2012
• 10. Fabrication of high quality factor GaAs/InAsSb photonic crystal microcavities by inductively coupled plasma etching and fast wet etching [O] . Prieto-González Iván, Muñoz-Camuñez Luis Enrique, González Taboada Alfonso, 2016
• 11. Plasma and Ion Etching for Failure Analysis. Part 2. The Etching of Plastic Encapsulant and Other Semiconductor Device Materials, Using the Technics Giga Etch 100-E Plasma Etch System [R] . Hardman, M., Mapper, D., Farren, J., 1986

• 1. A Novel Method for Producing Hydrogen from a Hydrocarbon Liquid Using Microwave In-liquid Plasma [J] . Andi Amijoyo Mochtar12 ,Shinfuku Nomura1 ,Shinobu Mukasa1 . 能源与动力工程 . 2016,第006期
• 2. Influence of Nanocrystalline ZrOsub2/subAdditives on the Fracture Toughness and Hardness of Spark Plasma Activated Sintered WC/ZrOsub2/subNanocomposites Obtained by Mechanical Mixing Method [J] . M. Sherif El-Eskandarany ,Hesham M. A. Soliman ,M. Omoric . 复合材料期刊（英文） . 2012,第1期
• 3. 等离子体方法刻蚀LED荧光粉表面缺陷的初步研究 [C] . 何志江 ,区琼荣 ,梁荣庆 . 上海照明科技及应用趋势论坛 . 2012
• 4. 金属催化氢等离子体刻蚀制备3D金刚石日盲探测器的方法研究 [A] . 毕明浩 . 2019