首页>
外国专利>
A physical vapour deposition coating device as well as a physical vapour deposition method
A physical vapour deposition coating device as well as a physical vapour deposition method
展开▼
机译：物理气相沉积涂覆装置以及物理气相沉积方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
The invention relates to a physical vapour deposition coating device (1), comprising a process chamber (2) with an anode (3) and a consumable cathode (4) to be consumed by an electrical discharge for coating a substrate located within the process chamber (2). The coating device (1) further includes a first electrical energy source (5) being connected with its negative pole to said consumable cathode (4), and a second electrical energy source (6) being connected with its positive pole to said anode (3). According to the invention, a third electrical energy source (7) is provided being connected with its negative pole to a source cathode (8) which is different from the consumable cathode (4). In addition, the invention relates to a physical vapour deposition method for coating a substrate.
展开▼
