首页> 外国专利> Base pad polishing pad and multi-layer pad comprising the same

Base pad polishing pad and multi-layer pad comprising the same

机译:基垫抛光垫和包括该基垫抛光垫的多层垫

摘要

Disclosed is a base pad of polishing pad, which is used in conjunction with polishing slurry during a chemical-mechanical polishing or planarizing process, and a multilayer pad using the same. Since the base pad according to the present invention does not have fine pores, it is possible to prevent permeation of polishing slurry and water and to avoid non uniformity of physical properties. Thereby, it is possible to lengthen the lifetime of the polishing pad.
机译:公开了一种抛光垫的基垫,其在化学机械抛光或平坦化过程中与抛光浆一起使用,以及使用该抛光垫的多层垫。由于根据本发明的基垫不具有细孔,因此可以防止抛光浆和水的渗透并避免物理性质的不均匀。由此,可以延长抛光垫的寿命。

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