首页> 外国专利> Reference data generation method, pattern defect inspection apparatus, pattern defect inspection method, and reference data generation program

Reference data generation method, pattern defect inspection apparatus, pattern defect inspection method, and reference data generation program

机译:参考数据生成方法,图案缺陷检查装置,图案缺陷检查方法和参考数据生成程序

摘要

A method of generating reference data is disclosed, in which two-value or multi-value gradated data of pixels is obtained in units of pixels from a design data of a pattern to be formed on an object, a processed data is obtained by carrying out calculations to the gradated data, and a reference data for use in a comparison with a sensed data obtained by image-picking up a pattern formed on the object is obtained based on the processed data, the method comprising carrying out a first calculation including a predetermined parameter to a value of an gradated data of a targeted pixel among the pixels to obtain a first processed data, and carrying out a second calculation including a predetermined parameter to the values of the gradated data of the targeted pixel and pixels located at the periphery of the targeted pixel to obtain a second processed data.
机译:公开了一种生成参考数据的方法,其中,从要形成在对象上的图案的设计数据以像素为单位获得像素的二值或多值灰度数据,通过执行来获得处理后的数据。基于处理后的数据,获得对灰度数据的计算,以及与通过对图像进行图像拾取而获得的感测数据进行比较的参考数据,该方法包括执行包括预定值在内的第一计算。将像素中的目标像素的灰度数据的值作为参数,以获得第一处理数据,并进行第二计算,该第二计算包括针对目标像素和位于像素的外围的像素的灰度数据的值的预定参数目标像素以获得第二处理数据。

著录项

  • 公开/公告号JP4018642B2

    专利类型

  • 公开/公告日2007-12-05

    原文格式PDF

  • 申请/专利权人 株式会社東芝;

    申请/专利号JP20040000516

  • 发明设计人 吉川 綾司;渡辺 秀弘;

    申请日2004-01-05

  • 分类号G01B11/30;G01B11/24;G06T1;

  • 国家 JP

  • 入库时间 2022-08-21 20:16:56

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号