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SYNTHESIS METHOD FOR A COMPOUND USED TO FORM A SELF-ASSEMBLED MONOLAYER, COMPOUND FOR FORMING A SELF-ASSEMBLED MONOLAYER, AND LAYER STRUCTURE FOR A SEMICONDUCTOR COMPONENT
SYNTHESIS METHOD FOR A COMPOUND USED TO FORM A SELF-ASSEMBLED MONOLAYER, COMPOUND FOR FORMING A SELF-ASSEMBLED MONOLAYER, AND LAYER STRUCTURE FOR A SEMICONDUCTOR COMPONENT
The present invention is a self-assembled monolayer directed to a method of synthesizing, in particular, the compounds used to form the monolayer for a semiconductor component, the method comprising: a) in a first synthesis step, ω- halo-alk-1-ene (Formula I) case, in b) the second synthesis step, and performing a terminal nucleophilic substitution of the halogen by other machine having a π-π mutual which can function groups, in particular one or more aromatic group (Ar) of the hydro-the product of the first synthesis step It characterized by silylation. The invention also self-relates to a compound, and the layer structure for forming a single-layer assembly. Method of synthesis The present invention can therefore efficiently produce the compound in high yield and simple cleaning requirements.
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