首页> 外国专利> SYNTHESIS METHOD FOR A COMPOUND USED TO FORM A SELF-ASSEMBLED MONOLAYER, COMPOUND FOR FORMING A SELF-ASSEMBLED MONOLAYER, AND LAYER STRUCTURE FOR A SEMICONDUCTOR COMPONENT

SYNTHESIS METHOD FOR A COMPOUND USED TO FORM A SELF-ASSEMBLED MONOLAYER, COMPOUND FOR FORMING A SELF-ASSEMBLED MONOLAYER, AND LAYER STRUCTURE FOR A SEMICONDUCTOR COMPONENT

机译：用于形成自组装单分子膜的化合物的合成方法，用于形成自组装单分子膜的化合物以及半导体组件的层结构

页面导航

摘要
著录项
相似文献

摘要

The invention relates to a synthesis method for a compound used to form a self-assembled monolayer, especially a monolayer for a semiconductor component, said method being characterised in that: a) it comprises a first synthesis step wherein a terminal nucleophile substitution of the halogen with a group able to perform a Π-Π interaction, especially a group having at least one aromatic group (Ar), is carried out on a ?-halogen-alk-1-ene (I), and b) the product of the first synthesis step is hydrolysed in a second synthesis step. The invention also relates to compounds for forming a self-assembled monolayer, and a layer structure. The inventive synthesis method thus enables compounds to be efficiently produced, generating a high yield and simple cleaning requirements.

机译：本发明涉及用于形成自组装单层，特别是用于半导体组件的单层的化合物的合成方法，所述方法的特征在于：a）它包括第一步合成步骤，其中卤素的末端亲核试剂取代在α-卤素-烷-1-烯（I）上进行具有能够进行Π-Π相互作用的基团，特别是具有至少一个芳族基团（Ar）的基团，并且b）该产物的产物。第一合成步骤在第二合成步骤中水解。本发明还涉及用于形成自组装单层的化合物和层结构。因此，本发明的合成方法使得能够有效地生产化合物，产生高产率和简单的清洁要求。

著录项

公开/公告号EP1636294B1

专利类型
公开/公告日2007-03-28

原文格式PDF
申请/专利权人 QIMONDA AG;
展开▼

申请/专利号EP20040738768
发明设计人 SEIFRITZ STEFFEN;KLAUK HAGEN;ZSCHIESCHANG UTE;SCHUETZ MARKUS;SCHMID GUENTER;HOLBERG STEFAN;EFFENBERGER FRANZ;HALIK MARCUS;MAISCH STEFFEN;
展开▼

申请日2004-06-18
分类号C08G85/00;
国家 EP
入库时间 2022-08-21 20:48:24

相似文献

专利
外文文献
中文文献