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The method of electro co-deposition to Ag-Cu eutectic alloy

机译:Ag-Cu共晶合金的电共沉积方法

摘要

The present invention satisfies the conductivity and ceramic and adhesion, corrosion resistance in a microwave oven magnetron part of the shield disk relates to a method of plating can shield disc on the Ag-Cu-based alloy to process, more specifically to environmentally friendly complexing agents Non CN- using Ag-Cu-based process (Ag78% wt-Cu22% wt) alloy plating be carried may have excellent adhesion and corrosion resistance characteristics at a time, such Ag-Cu alloy with the effect of cost reduction due to secondary contamination during plating is fused (Brazing) also in corrosion resistance under severe conditions to increase the adhesion at the bonding interface relates to a plating method of the Ag-Cu-based alloy the process can have a superior performance. ; Ag-Cu-based process (Ag78% wt-Cu22% wt) The preferred conditions for obtaining the alloy plating of the present invention and has a pH control agent (adjust) NH 4 with OH and fair pH10, 0.3M AgNO 3 , 0.27M Cu (NO 3 ) 2 3H 2 O, 0.5MC 4 H 5 NO 2 (number shinny polyimide) 3.5A / dm 2 -5.5A / dm 2 in the current density has a feature that can achieve the desired process based alloys in the condition.
机译:本发明满足屏蔽层盘在微波炉磁控管中的导电性和陶瓷及附着力,耐腐蚀性的要求,涉及一种将屏蔽层盘镀在Ag-Cu基合金上进行加工的方法,更具体地说涉及环保络合剂进行非CN的Ag-Cu基工艺(Ag78%wt-Cu22%wt)的合金电镀可一次具有出色的附着力和耐腐蚀性,这种Ag-Cu合金具有因二次污染而降低成本的效果在苛刻的条件下在抗熔合性(钎焊)过程中也能在苛刻的条件下进行熔合(钎焊)以增加键合界面处的附着力涉及一种基于Ag-Cu基合金的电镀方法,该工艺可具有优越的性能。 ; Ag-Cu基工艺(Ag78%wt-Cu22%wt)获得本发明合金镀层的优选条件,并具有pH调节剂(调节剂)NH 4 和OH,pH值为10 ,0.3M AgNO 3 ,0.27M Cu(NO 3 2 3H 2 O,0.5MC 4 H 5 2 (晶灵聚酰亚胺编号)3.5A / dm 2 -5.5A / dm 2 在电流密度方面具有可以在所需条件下实现所需工艺的合金的特征。

著录项

  • 公开/公告号KR100571796B1

    专利类型

  • 公开/公告日2006-04-17

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20030102029

  • 发明设计人 박해덕;최순돈;

    申请日2003-12-31

  • 分类号C25D3/64;

  • 国家 KR

  • 入库时间 2022-08-21 21:23:55

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