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APPARATUS METHOD AND COMPUTER PROGRAM PRODUCT FOR PERFORMING A MODEL BASED OPTICAL PROXIMITY CORRECTION FACTORING NEIGHBOR INFLUENCE
APPARATUS METHOD AND COMPUTER PROGRAM PRODUCT FOR PERFORMING A MODEL BASED OPTICAL PROXIMITY CORRECTION FACTORING NEIGHBOR INFLUENCE
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机译：执行基于模型的光学邻近校正因子对近邻影响的装置方法和计算机程序产品
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摘要
A method, a computer program product, and an apparatus for performing model-based optical proximity correction for factoring neighbor influences are provided to optimize a mask pattern by generating a series of multivariable equations on respective evaluation points. An apparatus for performing model-based optical proximity correction for factoring neighbor influences uses a lithographic projector. The lithographic projector includes radiation systems(Ex,IL), a mask table(MT), a substrate table, and a projection system(PL). The radiation systems supply a radiation projection beam. A mask, such as a reticle, is supported by a mask holder of the mask table. A first position setting unit, which accurately aligns the mask with respect to an item, is coupled with the mask table. A second position setting unit, which aligns a substrate with respect to the item, is coupled with the substrate table. The projection system obtains an image of a region on a target portion of the substrate, on which the mask is irradiated.
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