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THIN-FILM SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING THE SAME, ELECTRO-OPTICAL DEVICE, ELECTRONIC APPARATUS, AND THIN-FILM ELECTRONIC DEVICE
THIN-FILM SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING THE SAME, ELECTRO-OPTICAL DEVICE, ELECTRONIC APPARATUS, AND THIN-FILM ELECTRONIC DEVICE
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机译:薄膜半导体器件,其制造方法,光电器件,电子设备以及薄膜电子器件
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摘要
PROBLEM TO BE SOLVED: To increase the withstand voltage and reduce the off-leakage current, for example, in a thin-film semiconductor device, such as TFT.;SOLUTION: The thin-film semiconductor device comprises a semiconductor film which contains a channel region, a source region, and a drain region, and has an insular flat pattern, a gate insulating film laminated on or under the semiconductor film, and a gate electrode which is arranged facing the channel region via the gate insulating film. The gate insulating film is locally formed thick in a first portion pinched in between the layers of a peripheral region of the insular flat pattern of the semiconductor film and of the gate electrode.;COPYRIGHT: (C)2006,JPO&NCIPI
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