首页> 外国专利> Detecting trace impurities, in gases used in semiconductor manufacture, involves mixing process gas with ionizable gas and ionizing impurities to enforce its discharge

Detecting trace impurities, in gases used in semiconductor manufacture, involves mixing process gas with ionizable gas and ionizing impurities to enforce its discharge

机译:检测半导体制造气体中的痕量杂质涉及将工艺气体与可电离的气体混合并电离杂质以强制其排放

摘要

ionizing a gas at atmospheric pressure to detect its impurities includes mixing the gas with an ionizable gas and introducing the mixture into a chamber having a discharge electrode. A voltage applied to the electrode ionizes the ionizable gas so it discharges and ionizes impurities in the gas to be analyzed. The ionizable gas is pre-purified. The mixture is introduced into the chamber so that the chamber is continuously purged.
机译:在大气压下使气体电离以检测其杂质包括将气体与可电离的气体混合,然后将混合物引入具有放电电极的腔室中。施加到电极上的电压使可电离的气体电离,从而使要分析的气体中的杂质放电并电离。将可电离的气体预先纯化。将混合物引入腔室中,以便连续清洗腔室。

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