A process for making low band gap amorphous silicon thin film at low substrate temperature using the dilution at high plasma power regime

• 1. 一种低硼掺杂下高电导率氢化非晶硅薄膜的制备方法 [P] . 中国专利： CN103346069B . 2016.01.13
• 2. 一种低硼掺杂下高电导率氢化非晶硅薄膜的制备方法 [P] . 中国专利： CN103346069A . 2013-10-09
• 3. Thin film transistor array substrate, low temperature polysilicon thin film transistor, and method of manufacturing low temperature polysilicon thin film transistor [P] . 日本专利： JP2020512683A . 2020-04-23

  机译： 薄膜晶体管阵列基板，低温多晶硅薄膜晶体管以及制造低温多晶硅薄膜晶体管的方法

• 4. Method of manufacturing thin film transistor array substrate, low temperature polysilicon thin film transistor and low temperature polysilicon thin film transistor [P] . 韩国专利： KR20190091336A . 2019-08-05

  机译： 薄膜晶体管阵列基板的制造方法，低温多晶硅薄膜晶体管和低温多晶硅薄膜晶体管

• 5. THIN FILM TRANSISTOR ARRAY SUBSTRATE, LOW TEMPERATURE POLY-SILICON THIN FILM TRANSISTOR, AND METHOD FOR MANUFACTURING LOW TEMPERATURE POLY-SILICON THIN FILM TRANSISTOR [P] . 美国专利： US2019319134A1 . 2019-10-17

  机译： 薄膜晶体管阵列基板，低温多晶硅薄膜晶体管以及制造低温多晶硅薄膜晶体管的方法

• 1. Low temperature Raman study of PrCoO3 thin films on LaAlO3 (100) substrates grown by pulsed laser deposition [J] . PRAKASH R, KUMAR S, LEE C G, 中南大学学报（英文版） . 2010,第006期
• 2. REACTION PROCESSES FOR LOW TEMPERATURE (<1500C) PLASMA ENHANCED DEPOSITION OF HYDROGENATED AMORPHOUS SILICON THIN FILM TRANSISTORS ON TRANSPARENT PLASTIC SUBSTRATES [C] . G.N.Parsons, C.S.Yang Symposium on amorphous and microcrystalline silicon technology . 1999
• 3. Very low temperature materials and self-alignment technology for amorphous hydrated silicon thin film transistors fabricated on transparent large area plastic substrates [D] . Yang, Chien-Sheng 1998
• 4. Characterization of Doped Amorphous Silicon Thin Films through the Investigation of Dopant Elements by Glow Discharge Spectrometry. A Correlation of Conductivity and Bandgap Energy Measurements [O] . Pascal Sánchez, Olaya Lorenzo, Armando Menéndez, 2011
• 5. Compensation of decreased ion energy by increased hydrogen dilution in plasma deposition of thin film silicon solar cells at low substrate temperatures [O] . Verkerk, A.D., de Jong, M.M., Rath, J.K., 2009

• 1. A Thermochemical Process Using Expanding Plasma for Nitriding Thin Molybdenum Films at Low Temperature [J] . Isabelle Jauberteau ,Jean Louis Jauberteau ,Said Touimi . 工程（英文）（1947-3931） . 2012,第12期
• 2. Role of Hydrogen Dilution in the Low-Temperature Growth of Nanocrystalline Si:H Thin Films from siH_4/H_2 Mixture [J] . 陈城钊 ,邱胜桦 ,刘翠青 . 等离子体科学与技术：英文版 . 2009,第3期
• 3. Low temperature Raman study of PrCoO3 thin films on LaAlO3 （100） substrates grown by pulsed laser deposition [J] . PRAKASH R ,KUMAR S ,LEE C G . 中南大学学报 . 2010,第006期
• 4. Low-temperature Preparation of Photocatalytic TiO_2 Thin Films on Polymer Substrates by Direct Deposition from Anatase Sol [J] . Van HU ,Chunwei YUAN . 材料科学技术：英文版 . 2006,第2期
• 5. 衬底温度对非晶硅薄膜光学带隙的影响 [C] . 朱亚滨 ,缑洁 ,盛彦斌 . 第十一届全国核靶技术学术交流会 . 2011
• 6. 衬底温度对低功率制备ZnO薄膜光学特性的影响 [A] . 蔡利霞 . 2009