首页> 外国专利> Brief description of embodiments of a field effect transistor has a gate self - aligned, and transistor obtained by this

Brief description of embodiments of a field effect transistor has a gate self - aligned, and transistor obtained by this

机译:场效应晶体管的实施例的简要描述具有栅极自对准,并且由此获得的晶体管

摘要

A process allowing the position and the dimensions of the grid of a field-effect transistor as well as the gaps between source and grid, grid and drain to be fixed as early as the first masking operation. To this end, a mask is formed comprising source, grid and drain windows by using a first insulating or semi-insulating material then the three windows are filled by means of a second material. The ohmic source and drain contacts are deposited in the corresponding windows reopened by selective etching of the second material effected after masking the first part of the layer situated above the non-reopened window. Second selective etching after masking of the contacts allows a Schottky-type grid contact to be deposited.
机译:允许在第一次掩膜操作之前就固定场效应晶体管的栅极的位置和尺寸以及源极与栅极,栅极与漏极之间的间隙的过程。为此,通过使用第一绝缘或半绝缘材料形成包括源极,栅极和漏极窗口的掩模,然后通过第二材料填充这三个窗口。欧姆源极和漏极触点沉积在相应的窗口中,该第二窗口是通过对第二材料进行选择性蚀刻而重新打开的,该第二材料在掩盖未打开的窗口上方的层的第一部分之后进行。在对触点进行掩膜之后进行第二次选择性蚀刻,可以沉积肖特基型栅极。

著录项

  • 公开/公告号FR2461358B1

    专利类型

  • 公开/公告日1982-08-20

    原文格式PDF

  • 申请/专利权人 THOMSON CSF;

    申请/专利号FR19790017603

  • 发明设计人

    申请日1979-07-06

  • 分类号H01L21/314;H01L29/78;

  • 国家 FR

  • 入库时间 2022-08-22 12:30:18

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