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Method for simulating transistor characteristic, simulation method of characteristic of electronic circuit including transistor, and simulation program of transistor characteristic

机译:晶体管特性模拟晶体管特性,仿真方法,包括晶体管的晶体管特性和仿真程序

摘要

Problem to be solved: to provide a simulation method of the characteristics of the transistor to reproduce the measurement result better.The simulation method isA voltage is applied between the gate electrode and the semiconductor layer of the transistor until the trapped charge in the channel reaches a thermal equilibrium state of chargeIt is the process of obtaining the charge amount QT of the transient trap charge.The time QT of the charge QT isAs a function of superimposing multiple exponential functions with mutually different time constantsThe process of obtaining the charge amount QT.Diagram
机译:要解决的问题:提供晶体管特性的仿真方法,以更好地再现测量结果。 仿真方法ISA电压在晶体管的栅电极和半导体层之间施加电压,直到通道中的捕获电荷达到热平衡状态,是获得瞬态捕获量的电荷量Qt的过程。Qt 电荷Qt ISAS叠加多个指数函数的功能,其具有相互不同的时间常数QT.diagram的Qt.diagram的过程

著录项

  • 公开/公告号JP2021118237A

    专利类型

  • 公开/公告日2021-08-10

    原文格式PDF

  • 申请/专利权人 武漢天馬微電子有限公司;

    申请/专利号JP20200009620

  • 发明设计人 河内 玄士朗;

    申请日2020-01-24

  • 分类号H01L21/336;H01L29/786;

  • 国家 JP

  • 入库时间 2022-08-24 20:30:03

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