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Multi-probe ferromagnetic resonance (FMR) apparatus for wafer level characterization of magnetic films
Multi-probe ferromagnetic resonance (FMR) apparatus for wafer level characterization of magnetic films
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机译：用于磁膜的晶片水平表征的多探针铁磁共振（FMR）装置
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摘要
A ferromagnetic resonance (FMR) measurement system is disclosed with a plurality of “m” RF probes and one or more magnetic assemblies to enable a perpendicular-to-plane or in-plane magnetic field (Hap) to be applied simultaneously with a sequence of microwave frequencies (fR) at a plurality of “m” test locations on a magnetic film formed on a whole wafer under test (WUT). A FMR condition occurs in the magnetic film (stack of unpatterned layers or patterned structure) for each pair of (Hap, fR) values. RF input signals are distributed to the RF probes using RF power distribution or routing devices. RF output signals are transmitted through or reflected from the magnetic film to a plurality of “n” RF diodes where 1≤n≤m, and converted to voltage signals which a controller uses to determine effective anisotropy field, linewidth, damping coefficient, and/or inhomogeneous broadening at the predetermined test locations.
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