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PHOTOCONDUCTIVITY OF SEMI-INSULATING POLYSIL1CON

机译:半绝缘多晶硅的光电导率

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摘要

Semi-insulating polysilicon (SIPOS) thin films were deposited by Low Pressure Chemical Vapour Deposition (LPCVD) using different flow ratio N_2O/SiH_4 at 650 ℃. Al/SIPOS/Si capacitors were built and some of them were sintering at 430℃ in forming gas for 30 minutes. The refractive indexes ranging from 2.12 to 2.62 for as-deposited films. The photoconduction was investigated through current versus voltage analysis using white light. Experimental results show that the films are sensitive to white light and the photoconduction increase with the silicon content in the film. It was observed that the sintering decrease the sensitivity of the SIPOS films.
机译:在650℃下,采用不同流量比的N_2O / SiH_4,通过低压化学气相沉积(LPCVD)沉积半绝缘多晶硅(SIPOS)薄膜。制作了Al / SIPOS / Si电容器,其中一些在430℃的气体中烧结30分钟。沉积薄膜的折射率范围为2.12至2.62。通过使用白光的电流对电压分析来研究光电导。实验结果表明,该膜对白光敏感,并且光导率随膜中硅含量的增加而增加。观察到烧结降低了SIPOS膜的灵敏度。

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