Advances in the Process and in the Methodology of Emulsion Optical Masks Construction

机译：乳化光学掩模的制备工艺和方法学方面的进展

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This work presents the optical mask laboratory available at the Centro de Componentes Semicondutores - CCS/Unicamp. Micropatterms of 5 μm, typical dimensions for MEMs devices, for example, has been obtained by photoreduction and photorepetition processes. In these processes a pattern is optically transferred with a reduction of 10x from a photolith to a photographic emulsion on a glass substrate and then reduced by 5x and repeated. Under some limitations, optical masks can replace conventional electron beam or pattern generator masks with low cost, time and high reproducibility. Also, it is shown the methodology developed for these processes.

机译：这项工作介绍了可在Centro de Componentes Semicondutores-CCS / Unicamp上找到的光学掩模实验室。通过光还原和光重复过程已经获得了5μm的微型样品，例如MEMs器件的典型尺寸。在这些方法中，将图案以10倍的比例从光刻胶光学转移到玻璃基板上的感光乳剂中，然后再以5倍的比例进行还原并重复。在某些限制下，光学掩模可以低成本，时间和高再现性代替传统的电子束或图案发生器掩模。此外，还显示了为这些过程开发的方法。

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来源
《18th Symposium on Microelectronics Technology and Devices; 16th Symposium on Integrated Circuits and System Design; Sep 8-11, 2003; Sao Paulo, Brazil》|2003年|p.371-379|共9页
会议地点 Sao Paulo(BR);Sao Paulo(BR);Sao Paulo(BR);Sao Paulo(BR)
作者
Daniel S. de Lara; Luiz Otavio de Saraiva Ferreira; Jacobus W. Swart;
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作者单位

Centro de Componentes Semicondutores -Unicamp, CEP:13081-970, Cidade Universitaria -Campinas, S. P. Brazil;

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原文格式 PDF
正文语种 eng
中图分类无线电电子学、电信技术;
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Advances in the Process and in the Methodology of Emulsion Optical Masks Construction

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